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The Semiconductor Chemical Vapor Deposition (CVD) Equipment Market is segmented by Application (Foundry, Integrated Device Manufacturer (IDM), Memory Manufacturers), and Geography.
Fastest Growing Market:
Semiconductor Chemical Vapor Deposition (CVD) equipment market is anticipated to witness a CAGR of 8.5% over the forecast period 2020 - 2025. The surge in the growth plan for Nano semiconductor devices, growth in demand for smarter sensors and increase in demand for AI-powered chips are some of the factors influencing the growth of semiconductor CVD equipment in the global market. However, design complexity in chip processing and high cost of initial investment are the factors hindering the market establishment.
Semiconductor CVD equipment are used to produce semiconducting thin films and complex Nano and micro-structures. Various CVD processes include Atmospheric-Pressure Chemical Vapor Deposition (AP CVD), Density-Plasma Chemical Vapor Deposition (LP CVD), Low-pressure Chemical Vapor Deposition (LP CVD), and Metal-organic Chemical Vapor Phase Deposition (MO CVD).
|Integrated Device Manufacturer (IDM)|
|Rest of the World|
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Though the presence of many regional as well global players in the market is influencing the semiconductor CVD equipment market, the major chunk of the global market is captured by prominent players and hence the market for semiconductor CVD equipment is expected to be consolidated in nature. AIXTRON SE, Applied Materials, Inc., ASM International, CVD Equipment Corporation, Kokusai Semiconductor Equipment Corporation (KSEC), Lam Research Corporation, Tokyo Electron Limited, ULVAC, Inc., and Veeco Instruments Inc. are some of the major players present in the current market. All these players are involved in competitive strategic developments such as partnerships, new product development, and market expansion to augment their leadership position in the global semiconductor CVD equipment market.
1.1 Study Deliverables
1.2 Study Assumptions
1.3 Scope of the Study
2. RESEARCH METHODOLOGY
3. EXECUTIVE SUMMARY
4. MARKET DYNAMICS
4.1 Market Overview
4.2 Introduction to Market Drivers and Restraints
4.3 Market Drivers
4.3.1 Increase in Demand for Microelectronics and Semiconductor Devices
4.3.2 Rise in Application of the Technology for Several End-Users
4.4 Market Restraints
4.4.1 High Investment for the Technology
4.5 CVD Processes Technology Snapshot
4.5.1 Atmospheric-Pressure Chemical Vapor Deposition (AP CVD)
4.5.2 Density-Plasma Chemical Vapor Deposition (LP CVD)
4.5.3 Low-pressure Chemical Vapor Deposition (LP CVD)
4.5.4 Metal-organic Chemical Vapor Phase Deposition (MO CVD)
4.6 Industry Value Chain Analysis
4.7 Industry Attractiveness - Porter's Five Force Analysis
4.7.1 Threat of New Entrants
4.7.2 Bargaining Power of Buyers/Consumers
4.7.3 Bargaining Power of Suppliers
4.7.4 Threat of Substitute Products
4.7.5 Intensity of Competitive Rivalry
5. MARKET SEGMENTATION
5.1 By Application
5.1.2 Integrated Device Manufacturer (IDM)
5.1.3 Memory Manufacturers
5.1.4 Other Applications
5.2.1 North America
5.2.4 Rest of the World
6. COMPETITIVE LANDSCAPE
6.1 Company Profiles
6.1.1 AIXTRON SE
6.1.2 Applied Materials, Inc.
6.1.3 ASM International
6.1.4 CVD Equipment Corporation
6.1.5 Kokusai Semiconductor Equipment Corporation (KSEC)
6.1.6 Lam Research Corporation
6.1.7 Tokyo Electron Limited
6.1.8 ULVAC, Inc.
6.1.9 Veeco Instruments Inc.
7. INVESTMENT ANALYSIS
8. MARKET OPPORTUNITIES AND FUTURE TRENDS
** Subject to Availability