Market Size of Laser Photomask Industry
| Study Period | 2019 - 2029 |
| Base Year For Estimation | 2023 |
| CAGR | 2.00 % |
| Fastest Growing Market | Asia Pacific |
| Largest Market | Asia Pacific |
| Market Concentration | Medium |
Major Players
*Disclaimer: Major Players sorted in no particular order |
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Laser Photomask Market Analysis
The laser photomask market is expected to record a CAGR over 2% over the forecast period (2021-2026). A photomask is a fused silica plate, covered with a pattern of opaque, transparent, and phase-shifting areas that are projected onto wafers in the lithography process to define the layout of one layer of an integrated circuit.
- As transistors have become smaller and smaller, photomasks have become more complex, to transfer the pattern to silicon wafers accurately. The process of creating photomasks has become correspondingly more advanced, as even slight defects in a photomask can impact the silicon device's performance.
- Verifying that a photomask pattern is defect-free is very critical, especially in the case of high-revenue earning chips. Each chip is the end product in the semiconductor lithography process, with an integral part being the optical lithography that is enabled by a light source. The sources of light used for these photomasks are deep ultraviolet (DUV) and extreme ultraviolet (EUV) light sources.
- With the growing demand for semiconductors with even higher performance for applications, such as big data analysis, artificial intelligence, and the commercialization of driverless car technology, EUV exposure is garnering attention as a next-generation semiconductor manufacturing technology. This trend has significantly driven the production of effective photomasks. Toppan in 2016 developed a next-generation EUV photomask for leading-edge semiconductors. The new photomask minimizes unwanted reflections of light to peripheral sections during EUV exposure, emerging as a next-generation semiconductor manufacturing technology.
